Copper targets demonstrate both high purity and high conductivity, making them efficient in producing semiconductors and solar cells and in research activities such as X-ray fluorescence analysis. Because they are reliable materials, they are utilised in several sectors, as they are durable, have good thermal conductivity, and resist corrosion and oxidation.  

Copper targets are categorised based on the processes used in their manufacture, their purity levels, as well as the shape and size of the final products. Under the processes used in their manufacture, targets are classified into sputtering targets and electroplating targets. The former is obtained through high-temperature procedures, while the latter is obtained through electrochemical processes.  

Another major classification criterion is purity. Normally, targets classified as high-purity copper have a purity level surpassing 99.99%. Given specific size and shape requirements, copper targets can be made in the shape of plates, disks, squares, and rectangles, as well as custom-made in any shape and size for specific intended uses.

Physical Properties of High Purity Copper Target