99.9% Copper Oxide Target
Copper Oxide sputter targets have applications in the CD-ROM, decoration, semiconductors, displays, LEDs, photovoltaics, and functional coatings industries, and other industries involving optical data storage. Other industries also include car and architectural glass and glass coatings, optical communications, and coatings on architectural glass. Sputtering is a process in which a solid target material is bombarded with energetic particles, which eject atoms from the target material. Due to the extreme miniaturisation of components in the semiconductors and electronics industries, a high-purity sputtering target is required for thin film deposition.
Properties of 99.9% Copper Oxide Target
| Molecular Weight | 63.55 |
| Appearance | Reddish Metal |
| Melting Point | 1085°C |
| Boiling Point | 2562°C |
| Density | 8.96 g/cm3 |
| Solubility in H2O | N/A |
| Electrical Resistivity | 1.673 μΩ-cm @ 20°C |
| Electronegativity | 1.90 Paulings |
| Heat of Fusion | 13.26 kJ·mol-1 |
| Heat of Vaporisation | 300.4 kJ·mol-1 |
| Poisson's Ratio | 0.34 |
| Specific Heat | 0.39 kJ/kg K |
| Thermal Conductivity | 401 W·m-1·K-1 |
| Thermal Expansion | (25 °C) 16.5 µm·m-1·K-1 |
| Vickers Hardness | 369 MPa |
| Young's Modulus | 110–128 GPa |
